Ultrathin Ni12P5 nanoplates for supercapacitor applications | |
Chen, Zhichao; Shan, Aixian; Ye, Huanyu; Cui, Yimin; Wang, Rongming; Chen, Chinping | |
刊名 | JOURNAL OF ALLOYS AND COMPOUNDS |
2019 | |
卷号 | 782页码:545-555 |
关键词 | Transition metal phosphide Nickel phosphide Nanoplates Kirkendall effect Supercapacitors |
ISSN号 | 0925-8388 |
DOI | 10.1016/j.jallcom.2018.12.144 |
URL标识 | 查看原文 |
收录类别 | SCIE ; EI |
WOS记录号 | WOS:000458608600061 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/5922958 |
专题 | 北京航空航天大学 |
推荐引用方式 GB/T 7714 | Chen, Zhichao,Shan, Aixian,Ye, Huanyu,et al. Ultrathin Ni12P5 nanoplates for supercapacitor applications[J]. JOURNAL OF ALLOYS AND COMPOUNDS,2019,782:545-555. |
APA | Chen, Zhichao,Shan, Aixian,Ye, Huanyu,Cui, Yimin,Wang, Rongming,&Chen, Chinping.(2019).Ultrathin Ni12P5 nanoplates for supercapacitor applications.JOURNAL OF ALLOYS AND COMPOUNDS,782,545-555. |
MLA | Chen, Zhichao,et al."Ultrathin Ni12P5 nanoplates for supercapacitor applications".JOURNAL OF ALLOYS AND COMPOUNDS 782(2019):545-555. |
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